Yangzhou Guoxing is a high-tech company integrating R&D, production and sales. It is committed to providing customers with plasma etching and surface cleaning equipment, as well as supporting sales of electronic additives. Our products are mainly used in the manufacturing fields of semiconductors (chips and packages), panels and camera modules, electronic circuit boards, automobiles, medical and cosmetics, etc. Our customers include Luxshare Precision, Oufeiguang, Huahong Grace, Samsung Electronics, Taiwan First-class electronics manufacturing companies such as Xinxing Group.  For plasma cleaning machine surface activation (plasma plasma machine), the surface of the object must have good wettability to be able to adhere well to the adhesive material during painting, bonding, printing or pressure welding. Not only oily and grease-containing dirt will hinder wetting, but the clean surface of many materials cannot be sufficiently wetted by various liquids, adhesives and coatings. Liquid drips. Even after curing and drying, it cannot adhere to the surface. The reason is that the surface energy of the substrate is low. Materials with lower surface energy can wet materials with higher surface energy, but do not reverse it. The surface energy of the added liquid, also called surface tension, must be lower than the surface energy of the substrate in any case.

Guoxing technology plasma cleaning machine surface activation (plasma plasma machine) fully explained that most plastics have very low surface energy, and because the surface energy is too low, they cannot be wetted by adhesives and coatings. The reason is the non-polar surface. Liquid molecules cannot find the connection point where they can accumulate. The surface energy of the plasma cleaning machine to clean the object is increased, thereby being activated. In the meantime, an accumulation point is established for the added liquid. It is usually activated with chemical primers and liquid adhesion promoters. It is often highly corrosive and environmentally hazardous. On the one hand, sufficient ventilation must be carried out before subsequent processing, on the other hand, the activated state cannot be maintained for a long time. Non-polar materials such as polyolefins cannot be fully activated by chemical primers. Plasma cleaner activates the surface, in addition, it can be activated in arc corona. This is a form of atmospheric pressure plasma treatment. However, it can only process flat or convex surfaces, and it will be introduced into the arc during processing.  Considering the simplicity and efficiency of the production operation, the margin savings of the processed material and the cost-effectiveness of the processing device, the device is planned to adopt a horizontal placement structure. The reaction chamber is composed of a vacuum chamber and a plate electrode. It is an effective space for plasma (Plasma) processing reaction. The items to be processed are placed horizontally in the reaction chamber and can be designed as a multi-layer structure to facilitate mass operations; the vacuum system consists of vacuum valves, The vacuum pump, vacuum pipeline, vacuum system control actuators, etc. are responsible for pumping the air in the reaction chamber to a preset value and maintaining the corresponding vacuum degree during work; considering that the processing materials of this device require cleaning and activation, Therefore, the plasma generating source of this device is planned to adopt a plasma generating source with a specially processed waveform and a high-speed oscillation function. The system source provides plasma energy to the reaction chamber to excite the reacted gas in the reaction chamber to oscillate and ionize rapidly. Form the required plasma (Plasma) with cleaning ability; the function of the electronic control system is to intelligently and optimally automatically control the entire process of the device's process flow according to the preset process parameters and steps, and can self-tune and maintain the process parameters The stability of the process reaction gas inlet flow control system is mainly composed of a mass flow meter and a self-control electromagnetic valve. Its function is to precisely control the inlet flow rate of the reaction gas and maintain the required vacuum value during work.